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Brinker, Brueck
(Also offered as CBE, NSMS 518)
Underlying physical and chemical principles (optics, organic and inorganic chemistry, colloid chemistry, surface and materials science) for nanostructure formation using ‘top-down’ lithography (patterned optical exposure of photosensitive materials) and ‘bottom-up’ self-assembly. Labs will synthesize samples.
Prerequisite: NSMS 510.
{Spring}
Chemistry and Physics at the Nanoscale - NSMS 510
MSC 11 6325
1 University of New Mexico
Albuquerque, NM 87131
(505) 277-8900
Phone: (505) 277-6809
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